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The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method by A.I. Ievtushenko, M.G. Dusheyko, V.A. Karpyna, O.I. Bykov, P.M. Lytvyn, O.I. Olifan, V.A. Levchenko, A.A. Korchovyi, S.P. Starik, S.V. Tkach, G.V. Lashkarev
Published 2017-10-01
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