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    Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH<sub>4</sub> Plasma

    Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH<sub>4</sub> Plasma by Ki Seok Kim, You-Jin Ji, Ki-Hyun Kim, Ji-Eun Kang, Albert Rogers Ellingboe, Geun Young Yeom

    Published 2022-01-01
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