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    Robust sub-100 nm T-Gate fabrication process using multi-step development

    Robust sub-100 nm T-Gate fabrication process using multi-step development by Kaivan Karami, Aniket Dhongde, Huihua Cheng, Paul M. Reynolds, Bojja Aditya Reddy, Daniel Ritter, Chong Li, Edward Wasige, Stephen Thoms

    Published 2023-06-01
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