Development of EUV interference lithography for 25 nm line/space patterns by A.K. Sahoo, P.-H. Chen, C.-H. Lin, R.-S. Liu, B.-J. Lin, T.-S. Kao, P.-W. Chiu, T.-P. Huang, W.-Y. Lai, J. Wang, Y.-Y. Lee, C.-K. Kuan

Get full text