Workfunction Tuning of n-Channel MOSFETs Using Interfacial Yttrium Layer in Fully Silicided Nickel Gate nork Yu, Hongpeng, Pey, Kin Leong, Choi, Wee Kiong, Chi, D.Z., Fitzgerald, Eugene A., Antoniadis, Dimitri A.

Testu osoa

Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide nork Jin, Lijuan, Pey, Kin Leong, Choi, Wee Kiong, Fitzgerald, Eugene A., Antoniadis, Dimitri A., Chi, D.Z.

Testu osoa

Effects of Platinum on NiPtSiGe/n-SiGe and NiPtSi/n-Si Schottky Contacts nork Jin, Lijuan, Pey, Kin Leong, Choi, Wee Kiong, Fitzgerald, Eugene A., Antoniadis, Dimitri A., Chi, D.Z.

Testu osoa

Effect of Oxygen on Ni-Silicided FUSI Metal Gate nork Yu, H.P., Pey, Kin Leong, Choi, Wee Kiong, Chi, D.Z., Fitzgerald, Eugene A., Antoniadis, Dimitri A.

Testu osoa

The interfacial reaction of Ni on (100) Si₁₋xGex (x=0, 0.25) and (111) Ge nork Jin, Lijuan, Pey, Kin Leong, Choi, Wee Kiong, Fitzgerald, Eugene A., Antoniadis, Dimitri A., Pitera, Arthur J., Lee, Minjoo L., Chi, D.Z.

Testu osoa