Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO₂ 由 Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong, Shinjae You

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Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma 由 Inho Seong, Jinho Lee, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee, Wonnyoung Jeong, Yebin You, Shinjae You

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Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO₂ Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing 由 Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, Youngjun You, Kyungman Kim, ShinJae You

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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma 由 Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong, Jangjae Lee, Minsu Choi, Yebin You, Sangho Lee, Jinho Lee, Shinjae You

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A unified global model accompanied with a voltage and current sensor for low-pressure capacitively coupled RF discharge 由 Inho Seong, Sijun Kim, Woobeen Lee, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Minsu Choi, Byeongyeop Choi, Huichan Seo, Sangheon Song, Shinjae You

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Plasma Dielectric Etching with C₄H₂F₆ Isomers of Low Global-Warming Potential 由 Minsu Choi, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Jami Md Ehsanul Haque, Byeongyeop Choi, Seonghyun Seo, Sijun Kim, Shinjae You, Geun Young Yeom

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