Rapid fabrication of deep-submicron Josephson junctions by Cord, Bryan M. (Bryan Michael), 1980-

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Achieving sub-10-nm resolution using scanning electron beam lithography by Cord, Bryan M. (Bryan Michael), 1980-

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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale by Duan, Huigao, Manfrinato, Vitor Riseti, Yang, Joel K. W., Winston, Donald, Cord, Bryan M., Berggren, Karl K.

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Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist by Berggren, Karl K., Duan, Huigao, Winston, Donald, Yang, Joel K. W., Cord, Bryan M., Manfrinato, Vitor Riseti

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Limiting factors in sub-10 nm scanning-electron-beam lithography by Berggren, Karl K., Cord, Bryan M., Yang, Joel K. W., Duan, Huigao, Joy, David C., Klingfus, Joseph

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Suppressed Critical Current in Superconducting Nanowire Single-Photon Detectors With High Fill-Factors by Yang, Joel K. W., Kerman, Andrew J., Dauler, Eric A., Cord, Bryan M., Anant, Vikas, Molnar, Richard J., Berggren, Karl K.

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Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography by Berggren, Karl K., Yang, Joel K. W., Cord, Bryan M., Duan, Huigao, Klingfus, Joseph, Nam, Sung-Wook, Kim, Ki-Bum, Rooks, Michael J.

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Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist by Winston, Donald, Cord, Bryan M., Ming, B., Bell, David C., DiNatale, W. F., Stern, L. A., Vladar, A. E., Postek, M. T., Mondol, Mark K., Yang, Joel K. W., Berggren, Karl K.

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