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Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition by Vladimir A. Terekhov, Evgeniy I. Terukov, Yurii K. Undalov, Konstantin A. Barkov, Nikolay A. Kurilo, Sergey A. Ivkov, Dmitry N. Nesterov, Pavel V. Seredin, Dmitry L. Goloshchapov, Dmitriy A. Minakov, Elena V. Popova, Anatoly N. Lukin, Irina N. Trapeznikova
Published 2023-09-01
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