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    Electron and hole injection barriers between silicon substrate and RF magnetron sputtered In2O3 : Er films

    Electron and hole injection barriers between silicon substrate and RF magnetron sputtered In2O3 : Er films 由 Konstantin V. Feklistov, Aleksey G. Lemzyakov, Alexander A. Shklyaev, Dmitry Yu. Protasov, Alexander S. Deryabin, Evgeny V. Spesivsev, Dmitry V. Gulyaev, Alexey M. Pugachev, Dmitriy G. Esaev

    出版 2023-07-01
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