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    Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma

    Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma by Kim, Ki Seok, Ji, You-Jin, Kim, Ki-Hyun, Kang, Ji-Eun, Ellingboe, Albert Rogers, Yeom, Geun Young

    Published 2022
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