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Removal of Staphylococcus aureus using electro-fenton, UV/H2O2, and combination of electro-fenton and UV/H2O2 processes; optimization of operational parameters by Asiyeh Dokhani, Babak kheirkhah, Davood Kalantar-Neyestanaki, Farokh Rokhbakhsh-Zamin, Maryam Dolatabadi, Saeid Ahmadzadeh
Published 2024-04-01
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