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    Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti<sub>2</sub>N Films Deposited by RF-Magnetron Sputtering

    Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti<sub>2</sub>N Films Deposited by RF-Magnetron Sputtering by Andrés González-Hernández, William Aperador, Martín Flores, Edgar Onofre-Bustamante, Juan E. Bermea, Roberto Bautista-García, Federico Gamboa-Soto

    Published 2022-07-01
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