Highly Robust Atomic Layer Deposition‐Indium Gallium Zinc Oxide Thin‐Film Transistors with Hybrid Gate Insulator Fabricated via Two‐Step Atomic Layer Process for High‐Density Integ... by Dong-Gyu Kim, Su-Hwan Choi, Won-Bum Lee, Gyeong Min Jeong, Jihyun Koh, Seunghee Lee, Bongjin Kuh, Jin-Seong Park

Get full text