Electrical properties of amorphous chalcogenide/silicon heterojunctions modified by ion implantation by Hewak, Dan W., Fedorenko, Yanina G., Lee, Tae-Hoon, Hughes, Mark A., Colaux, Julien L., Jeynes, C., Gwilliam, Russell M., Homewood, Kevin P., Yao, Jin, Elliott, Stephen R., Gholipour, B., Curry, Richard J.

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