Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment ανά Isabelle Servin, Alexandre Teolis, Arnaud Bazin, Paule Durin, Olha Sysova, Corinne Gablin, Benoît Saudet, Didier Leonard, Olivier Soppera, Jean-Louis Leclercq, Yann Chevolot, Raluca Tiron, Thierry Delair, Stéphane Trombotto

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