Photophysical, photostability, and ROS generation properties of new trifluoromethylated quinoline-phenol Schiff bases by Inaiá O. Rocha, Yuri G. Kappenberg, Wilian C. Rosa, Clarissa P. Frizzo, Nilo Zanatta, Marcos A. P. Martins, Isadora Tisoco, Bernardo A. Iglesias, Helio G. Bonacorso

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