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    Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application

    Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application by R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A. Devi, C. Bock, M. Michel, A. Grabmaier

    Published 2022-06-01
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