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Synthesis of nanocrystalline silicon thin films using the increase of the deposition pressure in the hot-wire chemical vapour deposition technique by S. Halindintwali, D. Knoesen, R. Swanepoel, B.A. Julies, C. Arendse, T. Muller, C.C. Theron, A. Gordijn, P.C.P. Bronsveld, J.K. Rath, R.E.I. Schropp
Published 2010-01-01
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