THERMAL AND PHOTOCHEMICAL VAPOR-DEPOSITION OF FE FROM FE(CO)5 ON SI(100) by Jackman, R, Foord, J

STUDIES OF ADSORPTION AND ELECTRON-INDUCED DISSOCIATION OF FE(CO)5 ON SI(100) by Foord, J, Jackman, R

THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS by Jackman, R, Foord, J

METAL DEPOSITION ON SILICON: IN SITU SURFACE STUDIES. by Jackman, R, Foord, J

ELECTRON-BEAM STIMULATED CHEMICAL VAPOR-DEPOSITION OF PATTERNED TUNGSTEN FILMS ON SI(100) by Jackman, R, Foord, J

CHEMICAL VAPOR-DEPOSITION ON SILICON - INSITU SURFACE STUDIES by Foord, J, Jackman, R

APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. by Jackman, R, Foord, J

SURFACE-SCIENCE INVESTIGATIONS OF THE METALLIZATION OF SEMICONDUCTORS BY PHOTOCHEMICAL DEPOSITION AND RELATED TECHNIQUES by Foord, J, Jackman, R

Combating Unemployment: Is Flexibility Enough? by Jackman, R, Layard, R, Nickell, S

The unemployment crisis by Layard, R, Nickell, S, Jackman, R

Unemployment: Macroeconomic Performance and the Labour Market by Layard, R, Nickell, S, Jackman, R

Unemployment: Macroeconomic performance and the labour market by Layard, R, Nickell, S, Jackman, R

Combatting Unemployment: Is Flexibility Enough? by Jackman, R, Layard, R, Nickell, S

Semiconductor surface etching by halogens: Fundamental steps by Jackman, R, Price, R, Foord, J

CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FROM A NOVEL CAPACITIVELY COUPLED RF PLASMA SOURCE by Jackman, R, Beckman, J, Foord, J

INSITU X-RAY PHOTOEMISSION-STUDIES OF THE OXIDATION OF Y-BA-CU FILMS by Price, R, Jackman, R, Foord, J

CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH by Beckman, J, Jackman, R, Foord, J

DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA by Jackman, R, Beckman, J, Foord, J

High carrier mobility in polycrystalline thin film diamond by Looi, H, Jackman, R, Foord, J

THE INITIAL-STAGES OF DIAMOND GROWTH - AN ADSORPTION STUDY OF HOT-FILAMENT ACTIVATED METHANE AND HYDROGEN ON SI(100) by Jackman, R, Chua, L, Foord, J