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Double-gate structure enabling remote Coulomb scattering-free transport in atomic-layer-deposited IGO thin-film transistors with HfO2 gate dielectric through insertion of SiO2 inte... by Cheol Hee Choi, Taikyu Kim, Min Jae Kim, Gwang-Bok Kim, Jeong Eun Oh, Jae Kyeong Jeong
Published 2024-04-01
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