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    Change in Electrical/Mechanical Properties of Plasma Polymerized Low Dielectric Constant Films after Etching in CF<sub>4</sub>/O<sub>2</sub> Plasma for Semiconductor Multilevel Interconnects

    Change in Electrical/Mechanical Properties of Plasma Polymerized Low Dielectric Constant Films after Etching in CF<sub>4</sub>/O<sub>2</sub> Plasma for Semiconductor Multilevel Int... by Namwuk Baek, Yoonsoo Park, Hyuna Lim, Jihwan Cha, Taesoon Jang, Shinwon Kang, Seonhee Jang, Donggeun Jung

    Published 2023-06-01
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