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    Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C4H2F6-based gas

    Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C4H2F6-based gas by Nam Il Cho, Jong Woo Hong, Hee Jin Yoo, Hyeong Joon Eoh, Chan Ho Kim, Jun Won Jeong, Kyung Lim Kim, Jung Hun Kwak, Yong Jun Cho, Dong Woo Kim, Geun Young Yeom

    Published 2024-10-01
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