Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching by Hee-Jung Yeom, Min Young Yoon, Daehan Choi, Youngseok Lee, Jung-Hyung Kim, Shin-Jae You, Hyo-Chang Lee

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Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes by Si Jun Kim, Jang Jae Lee, Young Seok Lee, Hee Jung Yeom, Hyo Chang Lee, Jung-Hyung Kim, Shin Jae You

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Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions by Ho Jin Ma, Seonghyeon Kim, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Jung-Hyung Kim, Hyo-Chang Lee, Young-Jo Park

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Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography by Eun‐Seok Choe, Seungwook Choi, Ansoon Kim, Kwan‐Yong Kim, Hee‐Jung Yeom, Min Young Yoon, Seongwan Hong, Dong‐Wook Kim, Jung‐Hyung Kim, Hyo‐Chang Lee

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