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Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness by Pulikanti Guruprasad Reddy, Neha Thakur, Chien-Lin Lee, Sheng-Wei Chien, Chullikkattil P. Pradeep, Subrata Ghosh, Kuen-Yu Tsai, Kenneth E. Gonsalves
Published 2017-08-01
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