Remote epitaxy by Kim, Hyunseok, Chang, Celesta S., Lee, Sangho, Jiang, Jie, Jeong, Junseok, Park, Minseong, Meng, Yuan, Ji, Jongho, Kwon, Yeunwoo, Sun, Xuechun, Kong, Wei, Kum, Hyun S., Bae, Sang-Hoon, Lee, Kyusang, Hong, Young Joon, Shi, Jian, Kim, Jeehwan

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Controlled crack propagation for atomic precision handling of wafer-scale two-dimensional materials by Nezich, Daniel, Park, Yong Ju, Sundaram, Suresh, Li, Xin, Yue, Ruoyu, Zhou, Guanyu, Ahn, Jong-Hyun, Ougazzaden, Abdallah, Shim, Jaewoo, Bae, Sanghoon, Kong, Wei, Lee, DoYoon, Qiao, Kuan, Zhao, Ruike, Yeon, Hanwool, Choi, Chanyeol, Kum, Hyunseong, Ou, Yunbo, Lee, Kyusang, Moodera, Jagadeesh, Zhao, Xuanhe, Hinkle, Christopher W., Kim, Jeehwan

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Graphene nanopattern as a universal epitaxy platform for single-crystal membrane production and defect reduction by Kim, Hyunseok, Lee, Sangho, Shin, Jiho, Zhu, Menglin, Akl, Marx, Lu, Kuangye, Han, Ne Myo, Baek, Yongmin, Chang, Celesta S., Suh, Jun Min, Kim, Ki Seok, Park, Bo-In, Zhang, Yanming, Choi, Chanyeol, Shin, Heechang, Yu, He, Meng, Yuan, Kim, Seung-Il, Seo, Seungju, Lee, Kyusang, Kum, Hyun S., Lee, Jae-Hyun, Ahn, Jong-Hyun, Bae, Sang-Hoon, Hwang, Jinwoo, Shi, Yunfeng, Kim, Jeehwan

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