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    Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

    Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films by Pauline Kümmerl, Sebastian Lellig, Amir Hossein Navidi Kashani, Marcus Hans, Peter J. Pöllmann, Lukas Löfler, Ganesh Kumar Nayak, Damian M. Holzapfel, Szilárd Kolozsvári, Peter Polcik, Peter Schweizer, Daniel Primetzhofer, Johann Michler, Jochen M. Schneider

    Published 2024-09-01
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  2. 2
    Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

    Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films by Pauline Kümmerl, Sebastian Lellig, Amir Hossein Navidi Kashani, Marcus Hans, Peter J. Pöllmann, Lukas Löfler, Ganesh Kumar Nayak, Damian M. Holzapfel, Szilárd Kolozsvári, Peter Polcik, Peter Schweizer, Daniel Primetzhofer, Johann Michler, Jochen M. Schneider

    Published 2024-10-01
    Get full text
    Article

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