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    Trimethyl(phenyl)silane — a precursor for gas phase processes of SiCx:H film deposition: Synthesis and characterization

    Trimethyl(phenyl)silane — a precursor for gas phase processes of SiCx:H film deposition: Synthesis and characterization by Evgeniya N. Ermakova, Sergey V. Sysoev, Lyubov’ D. Nikulina, Irina P. Tsyrendorzhieva, Vladimir I. Rakhlin, Marina L. Kosinova

    Published 2015-12-01
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