Čájehuvvojit 1 - 1 oktiibuot 1 bohtosis ohcui M D Bavizhev', ohcanáigi: 0,02s Aiddostahte ozu
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    The influence of the substrate temperature change character during the growth on the topology of the Ge/Si(100) film surface

    The influence of the substrate temperature change character during the growth on the topology of the Ge/Si(100) film surface Dahkki L S Lunin, M D Bavizhev, I A Sysoev, V A Lapin, D S Kuleshov, F F Malyavin

    Almmustuhtton 2012-09-01
    Viečča ollesdeavstta
    Artihkal

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