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    Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity

    Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity by Wanting Li, Manchun Wu, Haini Chen, Peng Zhang, Zhixiong Cai, Shunyou Cai, Feiming Li

    Published 2024-09-01
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