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    Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching

    Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching by Francesco Ghezzi, Matteo Pedroni, Janez Kovač, Federica Causa, Anna Cremona, Mariano Anderle, Roberto Caniello, Silvia M. Pietralunga, Espedito Vassallo

    Published 2022-07-01
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