Markku Leskelä
Markku Leskelä (born 1950) is a Finnish chemist and professor emeritus at University of Helsinki, known for his leading research in atomic layer deposition (ALD).Markku Leskelä was the leader of the [http://www.aldcoe.fi/ Finnish Centre of Excellence in ALD] (2012-2017) by the University of Helsinki and VTT Technical Research Centre of Finland.
Markku Leskelä started ALD research (then called atomic layer epitaxy) in the early 1980s at Helsinki University of Technology (nowadays Aalto University) with Prof. Lauri Niinistö. In 2012, he received the ALD Innovation Prize at the international ALD conference. Provided by Wikipedia
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Atomic Layer Deposition of Boron‐Doped Al2O3 Dielectric Films by Xinzhi Li, Marko Vehkamäki, Mykhailo Chundak, Kenichiro Mizohata, Anton Vihervaara, Markku Leskelä, Matti Putkonen, Mikko Ritala
Published 2023-06-01
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Atomic Layer Deposition of ScF3 and ScxAlyFz Thin Films by Elisa Atosuo, Mikko J. Heikkilä, Johanna Majlund, Leevi Pesonen, Miia Mäntymäki, Kenichiro Mizohata, Markku Leskelä, Mikko Ritala
Published 2024-02-01
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Conversion of ALD CuO Thin Films into Transparent Conductive p‐Type CuI Thin Films by Alexander Weiß, Jacqueline Goldmann, Sakari Kettunen, Georgi Popov, Tomi Iivonen, Miika Mattinen, Pasi Jalkanen, Timo Hatanpää, Markku Leskelä, Mikko Ritala, Marianna Kemell
Published 2023-01-01
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