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    Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems

    Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems by Thomas Handte, Nicolas Scheller, Lars Dittrich, Manuel W. Thesen, Martin Messerschmidt, Stefan Sinzinger

    Published 2022-04-01
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