Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Masato Kiuchi

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Low-energy SiC2H6+ and SiC3H9+ ion beam productions by the mass-selection of fragments produced from hexamethyldisilane for SiC film formations by Satoru Yoshimura, Satoshi Sugimoto, Kensuke Murai, Masato Kiuchi

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Low-energy O+ ion beam induced chemical vapor deposition using hexamethyldisilane or hexamethyldisilazane for silicon dioxide film formation by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Masato Kiuchi

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Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Masato Kiuchi

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Injection of low-energy SiCH5+ ion-beam to Si substrate during chemical vapor deposition process using methylsilane by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi

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Silicon oxide film formation by spraying tetraethyl orthosilicate onto substrate with simultaneous low-energy SiO+ ion-beam irradiation by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi

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Identification of fragment ions produced by the decomposition of tetramethyltin and the production of low-energy Sn+ ion beam. by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi

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Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi

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Low-energy mass-selected ion beam deposition of silicon carbide with Bernas-type ion source using methylsilane by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi

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Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane by Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi

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Catalytic property of an indium-deposited powder-type material containing silicon and its dependence on the dose of indium nano-particles irradiated by a pulse arc plasma process by Satoru Yoshimura, Yoshihiro Nishimoto, Masato Kiuchi, Yoshiaki Agawa, Hiroyuki Tanaka, Makoto Yasuda

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Correction to: Laboratory experiments on agglomeration of particles in a granular stream by Yuuya Nagaashi, Tomomi Omura, Masato Kiuchi, Akiko M. Nakamura, Koji Wada, Sunao Hasegawa

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Laboratory experiments on agglomeration of particles in a granular stream by Yuuya Nagaashi, Tomomi Omura, Masato Kiuchi, Akiko M. Nakamura, Koji Wada, Sunao Hasegawa

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