Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography by Michael J. Haslinger, Oliver S. Maier, Markus Pribyl, Philipp Taus, Sonja Kopp, Heinz D. Wanzenboeck, Kurt Hingerl, Michael M. Muehlberger, Elena Guillén

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