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Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist by Winston, Donald, Cord, Bryan M., Ming, B., Bell, David C., DiNatale, W. F., Stern, L. A., Vladar, A. E., Postek, M. T., Mondol, Mark K., Yang, Joel K. W., Berggren, Karl K.
Published 2012
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