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Nanoscale physical analysis of localized breakdown events in HfO2/SiOX dielectric stacks : a correlation study of STM induced BD with C-AFM and TEM by Shubhakar, K., Pey, Kin Leong, Bosman, Michel, Thamankar, R., Kushvaha, S. S., Loke, Y. C., Wang, Z. R., Raghavan, Nagarajan, Wu, X., O'Shea, S. J.
Published 2013
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Conference Paper