Phase equilibria in the ZrO2–HfO2–Nd2O3 system at 1500 °C and 1700 °C by Yu.V. Yurchenko, O.A. Korniienko, O.I. Bykov, A.V. Samelyuk, S.V. Yushkevych, M.V. Zamula

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Phase equilibria in the ZrO2–HfO2–Sm2O3 system at 1500 °С by Yu V. Yurchenko, O.A. Kornienko, O.I. Bykov, A.V. Samelyuk, Yu M. Bataiev, S.V. Yushkevych, M.V. Zamula

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The Influence of Oxygen Pressure on ZnO:Al Thin Films Properties Grown Layer by Layer Growth Method at Magnetron Sputtering by A. I. Evtushenko, O. I. Bykov, L. O. Klochkov, O. S. Lytvyn, V. M. Tkach, O. M. Kutsay, S. P. Staryk, V. A. Baturyn, O. Y. Karpenko, M. G. Dusheyko, G. V. Lashkarev

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The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method by A.I. Ievtushenko, M.G. Dusheyko, V.A. Karpyna, O.I. Bykov, P.M. Lytvyn, O.I. Olifan, V.A. Levchenko, A.A. Korchovyi, S.P. Starik, S.V. Tkach, G.V. Lashkarev

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