Showing 1 - 20 results of 23 for search 'Prasad, Krishnamachar.', query time: 0.03s
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Fabrication and characterization of microelectronic devices, circuits and systems IV by Chan, Pak Kwong., Prasad, Krishnamachar.
Published 2008
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Development of deep submicron HEMT MMIC for millimetre-wave applications by Ng, Geok Eng, Yuan, Xiaocong, Yoon, Soon Fatt, Radhakrishnan, K., Law, Choi Look, Ooi, Boon Siew, Prasad Krishnamachar
Published 2008
Research Report -
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Fabrication and characterization of microelectronic devices, circuits and systems VI by Radhakrishnan, K.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
Research Report -
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Source line resistance failure issues and process optimisation of self aligned source etch by Su, Julia Hui Fong.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Electromigration reliability of copper interconnect in submicron microelectronics application by Ang, Kian Ann
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Device "S" leakage failure due to plasma damage by Tan, Siew Yoon.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Characterization of deep trench etch recipe by Tay, Chin Tiong.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Stress measurement in copper films by Teo, Chee Hiang.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Experimental study of copper contamination in VLSI technology by Tey, Shih Hwee.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Significance of process exhaust system on wafer fab operation and its performance improvement by Vedachalam Natanasabapathy
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Improvement in speed performance through transistor process optimization by Zheng, You.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Characterization and reliability studies of oxides grown by wet and dry oxidations for 0.25 micrometer CMOS technology by Chow, Yew Tuck.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Improvement of contact resistance through barrier metallization optimization by Goh, Edwin Beng Chye.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Process capability index (CPK) improvement for NMOS transistor IDSAT of 0.3 micrometer technology by Goh, Beng Lee.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Characteristics of chemical mechanical polishing in advanced wafer processing by Huang, Wen Ke.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Study and characterization of low dielectric constant materials for interlayer dielectric applications by Narayanan, Babu
Published 2008Other Authors: “…Prasad, Krishnamachar…”
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Influence of cleaning process on gate oxide integrity by Liu, Qing Guang.
Published 2008Other Authors: “…Prasad, Krishnamachar…”
Thesis