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    On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes

    On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes by Micha Haase, Marcel Melzer, Norbert Lang, Ramona Ecke, Sven Zimmermann, Jean-Pierre H. van Helden, Stefan E. Schulz

    Published 2020-06-01
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