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    Surface Stoichiometry and Depth Profile of Ti<sub><i>x</i></sub>-Cu<sub><i>y</i></sub>N<sub><i>z</i></sub> Thin Films Deposited by Magnetron Sputtering

    Surface Stoichiometry and Depth Profile of Ti<sub><i>x</i></sub>-Cu<sub><i>y</i></sub>N<sub><i>z</i></sub> Thin Films Deposited by Magnetron Sputtering by Arun Kumar Mukhopadhyay, Avishek Roy, Gourab Bhattacharjee, Sadhan Chandra Das, Abhijit Majumdar, Harm Wulff, Rainer Hippler

    Published 2021-06-01
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