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    Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films

    Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films by Bärtschi Manuel, Schachtler Daniel, Schwyn-Thöny Silvia, Südmeyer Thomas, Botha Roelene

    Published 2021-01-01
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