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    Rapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS2 films using gas-phase chemical vapor deposition

    Rapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS2 films using gas-phase chemical vapor deposition by Nitin Babu Shinde, Bellarmine Francis, M. S. Ramachandra Rao, Beo Deul Ryu, S. Chandramohan, Senthil Kumar Eswaran

    Published 2019-08-01
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