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  1. 1
    Characteristics of layered tin disulfide deposited by atomic layer deposition with H2S annealing

    Characteristics of layered tin disulfide deposited by atomic layer deposition with H2S annealing by Seungjin Lee, Seokyoon Shin, Giyul Ham, Juhyun Lee, Hyeongsu Choi, Hyunwoo Park, Hyeongtag Jeon

    Published 2017-04-01
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  2. 2
    Improved electrical properties of atomic layer deposited tin disulfide at low temperatures using ZrO2 layer

    Improved electrical properties of atomic layer deposited tin disulfide at low temperatures using ZrO2 layer by Juhyun Lee, Jeongsu Lee, Giyul Ham, Seokyoon Shin, Joohyun Park, Hyeongsu Choi, Seungjin Lee, Juyoung Kim, Onejae Sul, Seungbeck Lee, Hyeongtag Jeon

    Published 2017-02-01
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