Thermal atomic layer deposition of aluminum oxide, nitride, and oxynitride: A mechanistic investigation by Abu Talha Aqueel Ahmed, Afina faza Hafiyyan, Nurhidayati Nurhidayati, Fani Rahayu Hidayah Rayanisaputri, Khuloud A. Alibrahim, Shubhangi S. Khadtare, Shofiur Rahman, Abdullah N. Alodhayb, Nurul Taufiqu Rochman, Abu Saad Ansari

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