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    Investigation of properties of nitride and silicon oxide films grown by plasma-chemical deposition on a silicon substrate

    Investigation of properties of nitride and silicon oxide films grown by plasma-chemical deposition on a silicon substrate by Rubtsevich I. I., Solovyov Ya. A., Vysotskiy V. B., Dudkin A. I., Kovalchuk N. S.

    Published 2011-08-01
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