Data in support of Impact of precursor dosing on the surface passivation of AZO/AlOx stacks formed using atomic layer deposition by Wang, Y, Hobson, T, Swallow, J, McNab, S, O'Sullivan, J, Soeriyadi, A, Niu, X, Fraser, R, Dasgupta, A, Maitra, S, Altermatt, P, Weatherup, R, Wright, M, Bonilla, RS