Showing 1 - 7 results of 7 for search 'Szilárd Kolozsvári', query time: 0.03s Refine Results
  1. 1
    Process development for stabilization of vacuum arc plasma generation from a TiB2 cathode

    Process development for stabilization of vacuum arc plasma generation from a TiB2 cathode by Igor Zhirkov, Peter Polcik, Szilard Kolozsvári, Johanna Rosen

    Published 2019-01-01
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  2. 2
    Stoichiometric Cr2AlC MAX phase coatings deposited by HPPMS from composite targets using industrial deposition technology

    Stoichiometric Cr2AlC MAX phase coatings deposited by HPPMS from composite targets using industrial deposition technology by Yu-Ping Chien, Stanislav Mráz, Clio Azina, Szilárd Kolozsvári, Peter Polcik, Jochen M. Schneider

    Published 2024-03-01
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  3. 3
    Structure, chemistry, and mechanical properties of non-reactively sputtered Ti-Al-N

    Structure, chemistry, and mechanical properties of non-reactively sputtered Ti-Al-N by Sarah Christine Bermanschläger, Balint Istvan Hajas, Tomasz Wojcik, Eleni Ntemou, Daniel Primetzhofer, Szilard Kolozsvari, Friedrich Bleicher, Paul Heinz Mayrhofer

    Published 2025-04-01
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  4. 4
    Design of transition metal carbide/nitride superlattices with bilayer period-dependent mechanical and thermal properties

    Design of transition metal carbide/nitride superlattices with bilayer period-dependent mechanical and thermal properties by Barbara Schmid, Thomas Schöngruber, Tomasz Wojcik, Bálint Hajas, Eleni Ntemou, Daniel Primetzhofer, Bernhard Fickl, Sarah Christine Bermanschläger, Szilard Kolozsvari, Nikola Koutná, Paul Heinz Mayrhofer

    Published 2024-12-01
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  5. 5
    Quaternary diborides—improving the oxidation resistance of TiB2 ± z coatings by disilicide alloying

    Quaternary diborides—improving the oxidation resistance of TiB2 ± z coatings by disilicide alloying by Ahmed Bahr, Oskar Beck, Thomas Glechner, Alexander Grimmer, Tomasz Wojcik, Philip Kutrowatz, Jürgen Ramm, Oliver Hunold, Szilard Kolozsvári, Peter Polcik, Eleni Ntemou, Daniel Primetzhofer, Helmut Riedl

    Published 2023-09-01
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  6. 6
    Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

    Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films by Pauline Kümmerl, Sebastian Lellig, Amir Hossein Navidi Kashani, Marcus Hans, Peter J. Pöllmann, Lukas Löfler, Ganesh Kumar Nayak, Damian M. Holzapfel, Szilárd Kolozsvári, Peter Polcik, Peter Schweizer, Daniel Primetzhofer, Johann Michler, Jochen M. Schneider

    Published 2024-09-01
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  7. 7
    Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

    Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films by Pauline Kümmerl, Sebastian Lellig, Amir Hossein Navidi Kashani, Marcus Hans, Peter J. Pöllmann, Lukas Löfler, Ganesh Kumar Nayak, Damian M. Holzapfel, Szilárd Kolozsvári, Peter Polcik, Peter Schweizer, Daniel Primetzhofer, Johann Michler, Jochen M. Schneider

    Published 2024-10-01
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