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    Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective

    Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective by Devesh Thakare, Jean-François de Marneffe, Annelies Delabie, Vicky Philipsen

    Published 2023-09-01
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    Article
  2. 2
    Ni-Al Alloys as Alternative EUV Mask Absorber

    Ni-Al Alloys as Alternative EUV Mask Absorber by Vu Luong, Vicky Philipsen, Eric Hendrickx, Karl Opsomer, Christophe Detavernier, Christian Laubis, Frank Scholze, Marc Heyns

    Published 2018-03-01
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    Article

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