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Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions by Vladyslav Matkivskyi, Oskari Leiviskä, Sigurd Wenner, Hanchen Liu, Ville Vähänissi, Hele Savin, Marisa Di Sabatino, Gabriella Tranell
Published 2023-08-01
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