A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process by Chen, X, Samavedam, S, Narayanan, V, Stein, K, Hobbs, C, Baiocco, C, Li, W, Jaeger, D, Zaleski, M, Yang, H, Kim, N, Lee, Y, Zhang, D, Kang, L, Chen, J, Zhuang, H, Sheikh, A, Wallner, J, Aquilino, M, Han, J, Jin, Z, Li, J, Massey, G, Kalpat, S, Jha, R